Physical Vapor Deposition
Physical vapor deposition
PHYSICAL METHODS
A physical deposition process consists of three steps: 1. Emission of the particles from a source 2. Their transport to the substrate 3. The condensation on the substrate
Physical vapor deposition
a process by which a thin film of material is deposited on a
substrate according to the following sequence of steps: 1) the material to be deposited is converted into vapor by physical means; 2) the vapor is transported across a region of low pressure from its source to the substrate; and 3) the vapor undergoes condensation on the substrate to form the thin film
Typical set-up
alloy targets are struck at an angle of 45o by a pulsed
and focused laser beam the substrates are attached with the surface parallel to the target surface at a target-to-substrate distance of typically 2-10 cm
Laser ablation of the target
Process (4 stages)
material and creation of a plasma Dynamic of the plasma Deposition of the ablation material on the substrate Nucleation and growth of the film on the substrate surface
1. Laser ablation of the target material and creation of a plasma
The removal of atoms from the bulk material is done by
vaporization of the bulk at the surface region in a state of nonequilibrium The surface of the target is then heated up and the material is vaporized The temperature of the generated plasma plume is typically 10000 K
2. Dynamic of the plasma
The dependency of the plume shape on pressure can be described in three stages: The vacuum stage, where the plume is very narrow and forward directed; almost no scattering occurs with the background gases The intermediate region where a splitting of the high energetic ions from the less energetic species can be observed High pressure region where we find a more diffusion-like expansion of the ablated material
3. Deposition of the ablation material on the substrate
The third stage is important to determine
PHYSICAL METHODS
A physical deposition process consists of three steps: 1. Emission of the particles from a source 2. Their transport to the substrate 3. The condensation on the substrate
Physical vapor deposition
a process by which a thin film of material is deposited on a
substrate according to the following sequence of steps: 1) the material to be deposited is converted into vapor by physical means; 2) the vapor is transported across a region of low pressure from its source to the substrate; and 3) the vapor undergoes condensation on the substrate to form the thin film
Typical set-up
alloy targets are struck at an angle of 45o by a pulsed
and focused laser beam the substrates are attached with the surface parallel to the target surface at a target-to-substrate distance of typically 2-10 cm
Laser ablation of the target
Process (4 stages)
material and creation of a plasma Dynamic of the plasma Deposition of the ablation material on the substrate Nucleation and growth of the film on the substrate surface
1. Laser ablation of the target material and creation of a plasma
The removal of atoms from the bulk material is done by
vaporization of the bulk at the surface region in a state of nonequilibrium The surface of the target is then heated up and the material is vaporized The temperature of the generated plasma plume is typically 10000 K
2. Dynamic of the plasma
The dependency of the plume shape on pressure can be described in three stages: The vacuum stage, where the plume is very narrow and forward directed; almost no scattering occurs with the background gases The intermediate region where a splitting of the high energetic ions from the less energetic species can be observed High pressure region where we find a more diffusion-like expansion of the ablated material
3. Deposition of the ablation material on the substrate
The third stage is important to determine