Silica Fume Flour GW022
Greenwealth LLP
Silica Fume Flour 022
1
GWSFF022
Materials Supply Offer
Foundry Recycleable Materials
GW Silica Fume Flour 022
Method of Production
Baghouse collection of dust from Silicon Steel foundry processes,
Slag temperatue 1500 C
Metal pouring temperature 1250 - 1300 C.
Thermal oxidation of silicon is easily achieved by heating the SiO2 to temperatures typically in the range of 900-1200 degrees C. The atmosphere in the furnace where oxidation takes place can either contain oxygen or water vapor. Both of these molecules diffuse easily through the growing (SiO2)x layers at these high temperatures.
Possible reactions
SiO2 + 02 = (Si02)x
Si02 + H20 = (SiO2)x + H2
Saturated vapor pressure (in Pascals) for 850 °C
2·10-9
for 1100 °C
2·10-5
for 1300 °C
5·10-3
Silica Fume Flour SFF022
2
Colur: Gray
Contamination: Well below limitations
Particle size and distribution
Analyis
3
Particle size distribution
Mesh size conversion to mm and microns
MESH
mm
MICRON
No. 50
0.297
297
No. 60
0.250
250
No. 70
0.210
210
No. 80
0.177
177
No. 100
0.149
149
No. 120
0.125
125
No. 140
0.105
105
No. 170
0.088
88
No. 200
0.074
74
No. 230
0.063
63
No. 270
0.053
53
No. 325
0.044
44
No. 400
0.037
37
4
Typical Uses of Amorphous Silica
Bulk Density
(kg/m³)
Description
Typical Uses
< 400
Undensified: Raw material. Difficult to collect and package in this form. Fine granular in appearance with a grain size less than 0.5mm. (Minimal densification improves handling whilst agglomerations are loose).
Slurries, Blended
Cement; Grouts, concretes, mortars, and refractories. > 400 to < 700
Densified: Grain size greater than 0.5mm. Normal cementhandling techniques can be used on fully Densified amorphous silica. Agglomerates can require high shear mixing action to break up
Silica Fume Flour 022
1
GWSFF022
Materials Supply Offer
Foundry Recycleable Materials
GW Silica Fume Flour 022
Method of Production
Baghouse collection of dust from Silicon Steel foundry processes,
Slag temperatue 1500 C
Metal pouring temperature 1250 - 1300 C.
Thermal oxidation of silicon is easily achieved by heating the SiO2 to temperatures typically in the range of 900-1200 degrees C. The atmosphere in the furnace where oxidation takes place can either contain oxygen or water vapor. Both of these molecules diffuse easily through the growing (SiO2)x layers at these high temperatures.
Possible reactions
SiO2 + 02 = (Si02)x
Si02 + H20 = (SiO2)x + H2
Saturated vapor pressure (in Pascals) for 850 °C
2·10-9
for 1100 °C
2·10-5
for 1300 °C
5·10-3
Silica Fume Flour SFF022
2
Colur: Gray
Contamination: Well below limitations
Particle size and distribution
Analyis
3
Particle size distribution
Mesh size conversion to mm and microns
MESH
mm
MICRON
No. 50
0.297
297
No. 60
0.250
250
No. 70
0.210
210
No. 80
0.177
177
No. 100
0.149
149
No. 120
0.125
125
No. 140
0.105
105
No. 170
0.088
88
No. 200
0.074
74
No. 230
0.063
63
No. 270
0.053
53
No. 325
0.044
44
No. 400
0.037
37
4
Typical Uses of Amorphous Silica
Bulk Density
(kg/m³)
Description
Typical Uses
< 400
Undensified: Raw material. Difficult to collect and package in this form. Fine granular in appearance with a grain size less than 0.5mm. (Minimal densification improves handling whilst agglomerations are loose).
Slurries, Blended
Cement; Grouts, concretes, mortars, and refractories. > 400 to < 700
Densified: Grain size greater than 0.5mm. Normal cementhandling techniques can be used on fully Densified amorphous silica. Agglomerates can require high shear mixing action to break up